• 33 Ball Pond Road, Danbury, CT 06811-2828
  • 203-733-2110
Eliminator™ RF Filters

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Eliminator filters are used in RF (radio frequency) powered plasma processing systems to provide sub-system protection as well as for functional purposes such as simultaneously combining RF + DC power to a sputtering cathode. Manitou Systems designs and manufacturers off the shelf and application specific models to complement your complex plasma processes.

Eliminator filter products are categorized into various applications that are used in these applications:

eliminator-pass

  • Pass” type filters are installed in the coaxial transmission cable and used to pass the operational (fundamental) frequency which is typically 13.56 MHz  and reject (reflect) harmonic frequencies that exist above the fundamental frequency. These low pass filters find applications in an RF plasma power system to keep the harmonic energy that is generated in the plasma from exiting the matching network’s 50 ohm input and disrupting the operation of the RF generator and/or match. The filter will also act as a buffer to isolate an individual plasma from other plasmas operating in the same chamber simultaneously.                  

                                                                                                                                                                                                                                      

  • Eliminator BlockingBlocking type filters are installed in the conductor of the device or sub-system that requires isolation from RF energy for proper operation. Typical applications include the installation at the output of a DC, pulsed DC or AC plasma power supply  used to power a magnetron sputtering cathode or substrate bias stage. Specifically designed filters are also used with substrate heaters and thermocouples to prohibit RF energy that is conducted through a plasma discharge from exiting the vacuum process chamber and ultimately reaching the controller / metering equipment. Blocking filters may be employed to keep any common mode (conducted) RF energy from radiating outside of the process chamber and causing compliance and or sub-system performance issues.

   Application specific filters may be used to attenuate or block low frequency RF power used to power large area magnetron sputter cathodes that employ electro-magnets (used to sweep or         focus the plasma discharge. The filter provides isolation between the electro-magnet and it’s high-current control power supply. Contact Manitou Systems for detailed information on these        products. 

 

eliminator-combining

  • Combining type filters are used to dynamically combine both RF + DC or RF (lower frequency) + RF (higher frequency) power generators on a single plasma electrode or magnetron sputtering source. Both power generators typically operate at the same time and require high isolation from each other so they can be controlled independently. Typical applications include using a 13.56 MHZ + DC/pulsed DC plasma generators to power a magnetron sputtering cathode enabling deposition processes that benefit from DC and RF power.

 

  • Phase Shifters find many applications in today’s plasma processing systems. These devices may be fixed or continuously adjustable and used to adjust/set the phase delay in single or multiple RF generator plasma systems. Our Phase Shifter modules take the place of extended length coaxial cables used to enable automatic impedance matching networks to tune harmonically rich plasma loads (such as magnetron cathodes with dielectric sputtering target material).  Small signal (low power) models are used in the common exciter (CEX) circuit path while high power models are connected in the RF generator’s output power port or at the matching network’s RF power input connector.     

Click here to go to specific product pages for detailed information:

 

Downloads

  • Data sheet
  • Mechanical installation drawing
  • Owner’s manual

 

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