RF_Bias_generator_rotating_substrate_holder The Series PB3 integrated RF power system is the perfect choice to power small substrate stages and bias-able electrodes in a plasma system. Manitou has supplied 100’s of the Model PB3-100D RF systems (see a typical unit on the right side of the image) to OEMs and end-users to provide finely controlled 13.56MHz bias plasma power.

 

 

 

Why should you consider using the Model PB3 in your plasma system ?

How does the PB3 integrated system compare to using a traditional 2-piece (separate RF generator and match) component set ?

What are the advantages and disadvantages of manually adjusted matching network tuning ?

What type and length of coaxial cable is used to connect the PB3 to the substrate stage ?

 

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