The Series PB RF power system is designed for low power applications including RF bias and sputtering in R&D and educational plasma systems. All PB-3 models include a robust RF power generator module and a manually adjustable impedance matching network in the same enclosure.
These models offer the user a complete and cost effective way to add an RF plasma process to an existing vacuum system.
The addition of a short (3 to 5 feet long) coaxial RF output cable completes your system and enables the PB3 to provide a complete, economical RF system to power small magnetron sputtering sources, plasma reactors, or, to provide an RF substrate bias in a vacuum process system.
We also offer models without an internal matching network. These versions will complement process system designs which locate the impedance matching network remotely from the PB-3 RF generator. Our Model MTK impedance matching network is an excellent choice to complement the Model PB3 in this configuration.
Click the PB3 model link below to view detailed product information: