The Series PB3 integrated RF power system is the perfect choice to power small substrate stages and bias-able electrodes in a plasma system. Manitou has supplied 100’s of the Model PB3-100D RF systems (see a typical unit on the right side of the image) to OEMs and end-users to provide finely controlled 13.56MHz bias plasma power.
Why should you consider using the Model PB3 in your plasma system ?
How does the PB3 integrated system compare to using a traditional 2-piece (separate RF generator and match) component set ?
What are the advantages and disadvantages of manually adjusted matching network tuning ?
What type and length of coaxial cable is used to connect the PB3 to the substrate stage ?