• 33 Ball Pond Road, Danbury, CT 06811-2828
  • 203-733-2110
BDS-Plasma Matrix Tabletop Plasma Systems

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PLASMA MATRIX

Tabletop plasma processing systems available with a 2.5 to 40 liter vacuum chamber and powered by a 13.56MHz RF system

Applications include:

  • Plasma activation
  • Plasma etching
  • Ashing
  • SEM/TEM sample preparation
  • Textile surface treatments
  • Cleaning of precision parts
  • Ophthalmic wettability treatment
  • Plastic surface treatment
  • Sterilization of medical devices
  • Dental implant cleaning & treatment

The Plasma Matrix & Super Plasma Matrix tabletop plasma reactors are designed to provide R&D and industrial plasma cleaning, etching and surface activation processes. This low cost system includes many features for your developmental or pilot production applications.

The easy to use LCD touch screen display is friendly and the controller is optimized to oversee all system functions as well as keeping the plasma process stable and repeatable.  The Plasma Matrix vacuum chamber is manufactured from 304 stainless steel for easy cleaning and long life.

We offer three versions of  the Plasma Matrix :

  1. Plasma Matrix V with a 2.5 liter with a 200 watt / 13.56MHz RF generator and  a manually controlled impedance matching network and a single gas channel controlled with a needle valve
  2. Plasma Matrix Plus with a 2.5 liter with a 200 watt / 13.56MHz RF generator and  a manually controlled impedance matching network and two gas channels controlled with MFCs (mass flow controllers)
  3. Super Plasma Matrix with a 40 liter with a 300 watt / 13.56MHz RF generator and  an automatically controlled impedance matching network and two gas channels controlled with MFCs (mass flow controllers)

Product Specifications

Plasma Matrix V Plasma Matrix Plus Super Plasma Matrix Plus
Process chamber volume and size 2.64 Liters

220mm L X 100mm H X 120mm W

2.64 Liters

220mm L X 100mm H X 120mm W

40 Liters

380mm L X 250mm H X 424mm W

RF power generator

13.56MHz

 200 watts  200 watts  300 watts
 Impedance matching  Manually adjusted inductive type  Manually adjusted inductive type  Automatic capacitive type
 Process gas channels  1  2  2
 Process gas control  Needle valve  Mass flow controllers

25 SCCM

 Mass flow controllers

50 SCCM

 AC mains input  240VAC 50/60Hz 1 phase  240VAC 50/60Hz 1 phase  240VAC 50/60Hz 1 phase

Pressure measurement via Pirani Gauge

Vacuum pump connection KF25 / KF50

Base vacuum better than 5×10-2 mBar

User interface – touch screen

General Specifications

  • 304 stainless steel vacuum chamber
  • Various vacuum pumping packages
  • Compliance – CE MARK
  • Country of manufacture – ITALY

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