• 33 Ball Pond Road, Danbury, CT 06811-2828
  • 203-733-2110
BDS-Plasma Matrix Tabletop Plasma Systems

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          Super Plasma Matrix Model                                                                Plasma Matrix Model

                 40 Liter Process Chamber                                                           2.64 Liter Process Chamber    

                                     

                                                        A look into the open plasma process chamber

 

PLASMA MATRIX

Tabletop plasma processing systems available with a 2.5 to 40 liter vacuum chamber and powered by a 13.56MHz RF system

Applications include:

  • Plasma activation
  • Plasma etching
  • Ashing
  • Substrate preparation / conditioning
  • SEM/TEM sample preparation
  • Textile surface treatments
  • Cleaning of precision parts
  • Ophthalmic wettability treatment
  • Plastic surface treatment
  • Sterilization of medical devices
  • Dental implant cleaning & treatment

Click here for a detail list of applications for the Plasma Matrixx systems

Typical process gasses (compatible with these systems):

  • Air
  • Argon
  • Nitrogen
  • Helium
  • Oxygen (Note: use of oxygen process gas in concentrations of 20>100% requires use of a “corrosive” compatible vacuum pump.)
  • Nitrous oxide (Note: use of oxygen process gas in concentrations of 20>100% requires use of a “corrosive” compatible vacuum pump.)

The Plasma Matrix & Super Plasma Matrix tabletop plasma reactors are designed to provide R&D and industrial plasma cleaning, etching and surface activation processes. This low cost system includes many features for your developmental or pilot production applications.

The easy to use LCD touch screen display is friendly and the controller is optimized to oversee all system functions as well as keeping the plasma process stable and repeatable.  The Plasma Matrix vacuum chamber is manufactured from 304 stainless steel for easy cleaning and long life.

We offer three versions of  the Plasma Matrix :

  1. Plasma Matrix V with a 2.5 liter with a 200 watt / 13.56MHz RF generator and  a manually controlled impedance matching network and a single gas channel controlled with a needle valve
  2. Plasma Matrix Plus with a 2.5 liter with a 200 watt / 13.56MHz RF generator and  a manually controlled impedance matching network and two gas channels controlled with MFCs (mass flow controllers)
  3. Super Plasma Matrix with a 40 liter with a 300 watt / 13.56MHz RF generator and  an automatically controlled impedance matching network and two gas channels controlled with MFCs (mass flow controllers)

Product Specifications


Model                                                    Plasma Matrix V                      Plasma Matrix Plus               Super Plasma Matrix Plus

Process chamber dimensions          0.1 cu ft. (2.64 L)                     0.1 cu ft. (2.64 L)                   1.41 cu ft. (40 L)

                                                               8.7″L x 4.72″W x 3.94″H        8.7″L x 4.72″W X 3.94″H    15″W x 16.7″W x 9.84″H

                                                               220mm x 120mm x 100mm  220mm x 120mm 100mm  380mm x 424mm x 250mm

RF power (13.56MHz)                      200 watts                                   200 watts                                300 watts

Impedance matching                        Manually adjusted                   Manually adjusted                 Automatic

Process gas channels                        1                                                    2                                                2

Process gas control                           Needle valve                              Mass flow controllers           Mass flow controllers

                                                                                                                    25 SCCM                                 25 SCCM

AC Mains input                                 100>240VAC                             100>240VAC                         100>240VAC

                                                             50/60 Hz 1 phase                      50/60 Hz 1 phase                 50/60 Hz 1 phase

Vacuum pump connection              KF25                                            KF25                                        KF40

Vacuum pump requirement           2.3CFM                                       2.3CFM                                   5.9CFM

System dimensions                          18″ x 7.5″ x 15.5″ (450mm x 190mm x 395mm)                   20.75″ x 22.5 x 21″ (525mm x 570mm 530mm)

Plasma system order P/N                00010373                                   00010008                              00010374

Product weight (system only)

Shipping weight (system only)      45kg                                            45kg   


Options & Accessories

Recommended vacuum pump       2.3CFM                                        2.3CFM                                  5.9CFM

Vacuum pump (non-corrosive)

                                      order P/N     00010009                                   00010009                               00010371

Vacuum pump (corrosive)

                                      order P/N     Contact the factory 

Vacuum pump notes: The typical rotary vane pump is designed for use with a hydrocarbon based fluid which will accommodate plasma process that have an oxygen (O2) gas content of less than 20%. If the oxygen gas percentage is 20% or higher, the corrosive type pump is required. This pump type is designed for use with an inert fluid.   


General Specifications

Pressure measurement via Pirani Gauge

Base vacuum better than 37.5 milli Torr (5×10-2 mBar)

User interface – 240 x 128 pixel touch screen

Vacuum chamber made from 304 stainless steel

Compliance – CE

Country of manufacture – ITALY

Packaging – wooden crate and strapped to a shipping skid


What’s Included

Basic Package

Plasma Matrix process system

AC power cord (2 meters long) for use with 115VAC single phase AC mains

Vacuum hose (1 meter long) with KF fittings

KF centering ring and clamp for each end of the hose

Optional vacuum pump

Dual stage (non corrosive) rotary pump – Plasma Matrix V & Plus – pump speed @60Hz 2.3CFM, ultimate pressure 1.5×10-3 Torr

Dual stage (non corrosive) rotary pump – Super Plasma Matrix – pump speed @60Hz 5.9CFM, ultimate pressure 1.5×10-3 Torr

AC power cord (4 feet long) to connect the pump to the system’s outlet

Hydrocarbon type pump oil

Notes:

The pump and fluid may be drop shipped directly from the manufacturer

An outlet mist filter is also recommended for proper operation  


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