This page of the RF Witch Doctor Chronicles provides a look into adding an RF or DC Bias Feature to your new design or existing plasma processing system.
When should DC or RF bias be used ?
What is the typical and maximum RF power level to power a substrate stage bias ? (assuming RF bias function only)
What is the typical and maximum RF power level to power a substrate stage sputter etch (clean) & RF bias ?
Which RF Power control mode is used during the RF bias process ?
What are the advantages and disadvantages of manually adjusted matching network tuning ?
What type and length of coaxial cable is used to connect the RF System to the substrate stage ?
Additional details to note when designing your RF Bias System:
Some measurements to make when testing your RF Bias System:
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